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Vacuum Chamber PM Technique
LAM 2300 EXELAN FLEX
Oxide Etch Graphite Electrode
OBJECTIVE:
TO EFFECTIVELY PM THE LAM OXIDE ETCH GRAPHITE ELECTRODE IN A TIMELY MANNER, WHILE HELPING TO IMPROVE TOOL RECOVERY AND REDUCE PARTICLE PROBLEMS ASSOCIATED WITH TRYING TO CLEAN WITH SCOTCH-BRITE™
 
Vacuum Chamber: LAM 2300 EXELAN FLEX OXIDE ETCH
Vacuum Chamber Process Residue: PROCESS INDUCED RESIDUE
Vacuum Chamber Components: GRAPHITE ELECTRODE
Old Procedure: 1+ hours using Scotch-Brite™ & DI water
Recovery time: Varies with particle issues
Interval: PM graphite electrode on every LAM OXIDE ETCH PM every two weeks
New Procedure: <30 Minutes using Diamond ScrubPADS & DI water
ABLE TO REMOVE MUCH MORE DEPOSITION BUILDUP WITH DIAMOND SCRUBPADS
RECOVERY TIME: Improved recovery time with particle reduction
Vacuum Chamber Products:
LAM 2300 OXIDE ETCH GRAPHITE ELECTRODE PM KIT
PM Kit P/N: HT4500-LAMEL1
(1) HT4514D-10-1 140 Grit Diamond ScrubPAD
(1) HT4528D-10-1 280 Grit Diamond ScrubPAD
(1) HT4536D-10-1 360 Grit Diamond ScrubPAD
(1) HT4790-5 UltraSOLV® Foam Wiper
LAM 2300 Exelan Graphite Electrode PM Procedure:
View “How to” instructional videos on http://www.foamtecintlwcc.com/video/
Step 1: Using proper procedures and safety guidelines and remove LAM OXIDE ETCH Graphite Electrode from ETCH chamber and prepare for PM
Step 2: Place outer electrode onto a wet clean workbench (See Fig 1)
Outer electrode on wet clean bench
Fig 1: Outer electrode on wet clean bench
Step 3: Take 140 Grit Diamond ScrubPAD and moisten with DI water
Step 4: Moisten the top of the electrode with DI water and scrub off the deposition from the electrode (See Fig 2 & 3)
ScrubPAD scrubbing elecrtode
ScrubPAD scrubbing electrode
Fig 2 & 3: 140 Grit Diamond ScrubPAD cleaning off top of electrode
Step 5: In conjunction with using the Grit Diamond ScrubPAD, continue to rinse off the electrode with DI water (See Fig 4)
Rinsing electrode
Fig 4: Rinsing off the electrode with DI water
Step 6: Continue to rinse off the Grit Diamond ScrubPAD as it loads up with deposition (See Fig 5 & 6)
ScrubPAD loaded with deposition
Rinsing ScrubPAD
Fig 5: ScrubPAD loaded up with deposition
Fig 6: Rinsing off ScrubPAD with DI water
Step 7: Continue to scrub the entire front side of the graphite electrode with the 140 Grit Diamond ScrubPAD
Step 8: After completely scrubbing entire front side of the graphite electrode with the 140 Grit Diamond ScrubPAD, using the same technique described above, repeat steps 3 – 7 using the 280 Grit Diamond ScrubPAD
Step 9: After scrubbing entire front side of the graphite electrode with the 280 Grit Diamond ScrubPAD, using the same technique described above, repeat steps 3 – 7 using the 360 Grit Diamond ScrubPAD
NOTE: EACH GRIT DIAMOND ScrubPAD WILL PROVIDE A FINER POLISHED LOOK TO THE ELECTRODE, HELPING RETURN THE ELECTRODE BACK TO A NEWER CONDITION (See Fig 7)
Scubbed electrode
Fig 7: A completely scrubbed electrode
Step 10: After completely scrubbing the outer electrode, take the HT4790 UltraSOLV® Foam Wiper and pull across the entire electrode to help remove any loosely embedded deposition within the electrode
NOTE: DO NOT USE MORE THAN 2 ULTRASOLV® FOAM WIPERS (See Fig 8)
Pull UltraSOLV Foam Wiper across electrode
Fig 8: Pulling the UltraSOLV® Foam Wiper across the electrode
NOTE: THE UltraSOLV® FOAM WIPER IS AN IMPORTANT STEP TO HELP REMOVE LOOSE PARTICLES THAT ARE DEEP WITHIN THE OUTER ELECTRODE
Step 11: Place the outer electrode in Ultrasonic Sink to help rinse the part effectively (See Fig 9)
Ultrasonic sink
Fig 9: Outer electrode in Ultrasonic Sink
Step 12: Place the outer electrode in oven and bake out moisture to help reduce out gassing
Step 13: After baking the inner and outer electrode in oven and prior to placing back into LAM OXIDE ETCH Chamber, wipe the graphite on the backside of the electrode with the remaining dry UltraSOLV® Foam Wipers (See Fig 10 & 11)
Use dry UltraSOLV Foam Wiper
Particles removed
Fig 10: Wiping graphite on backside of electrode with dry UltraSOLV® Foam Wiper
Fig 11: Particles removed by UltraSOLV® Foam Wiper AFTER soaking in Ultrasonic Sink
NOTE: TO ENSURE BEST RECOVERY RESULTS, RECOMMEND USING FOAMTEC INTERNATIONAL WCC CLEANING TECHNIQUE FOR REMAINDER OF LAM 2300 OXIDE ETCH CHAMBER PM
USE IPA WITH MiraWIPES® AND MiraSWABS® AND WIPE DOWN REMAINING CHAMBER PARTS AND CHAMBER BODY
FOLLOW APPLICATION NOTE FOR CLEANING HOT PLATE ASSEMBLY
Step 14: Using LAM approved procedures, return graphite electrode back to LAM OXIDE ETCH Chamber and return tool back to production

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