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Before Foamtec Logo After
BEFORE AFTER
Vacuum Chamber PM Technique
Tok Photo Top Plate
OBJECTIVE:

TO EFFECTIVELY REMOVE THE CONDENSED PHOTO RESIST FILM FROM THE TOK PHOTO TOP PLATE IN A TIMELY MANNER, ELIMINATE PEELING DEFECTS AND IMPROVE TOOL PERFORMANCE

 
Vacuum Chamber: TOK PHOTO
Vacuum Chamber Process Residue: CONDENSED PHOTO RESIST FILM
Vacuum Chamber Components: TOP PLATE
Old Procedure: IPA & GENERAL WIPER
PROBLEM:
  • NOT ABLE TO REMOVE PHOTO RESIST FILM
  • LEADS TO PEELING EFFECT
  • IMPACTS PRODUCTION YIELD AND WAFERS/HR
New Procedure:

FOAMTEC INTERNATIONAL’S PRODUCTS WITH DI WATER & IPA

RESULTS:
  • NO PEELING EFFECT
  • REDUCTION OF WIPERS AND IPA
  • SIGNIFICANTLY REDUCED PM TIME
Foamtec Products
Vacuum Chamber Products:
TOK PHOTO TOP PLATE PM Kit

PM Kit P/N:  HT4500-TOKTP1

  • (2) HT4754 UltraSOLV® Sponge
  • (4) HT4536DC3-1 360 Grit Diamond ScrubDISK®
  • (2) HT4536D-10-1 360 Grit Diamond ScrubPAD
  • (1) FT901 ErgoSCRUB® W/Hook
  • (1) HT5790S-25 MiraWIPES®
TOK Photo Top Plate PM Procedure:
View “How to” instructional videos on http://www.foamtecintlwcc.com/video/
Step 1: Using proper procedures and safety guidelines prepare TOK Photo Top Plate for wet clean
 
Step 2: Stage a small container of DI water inside a large plastic bag next to TOK Photo Top Plate
 
Step 3: Attach HT4536DC3-1, 360 Grit Diamond ScrubDISK® onto FT901 Soft ErgoSCRUB®
Step 4:

Place HT4754  UltraSOLV® Sponge, ErgoSCRUB® w/ScrubDISK® and ScrubPAD in container of DI water to moisten products (See Fig 1)

Products in DI water
Fig 1: Foamtec International products in container of DI water
Step 5: Take dampened UltraSOLV® Sponge and pre-wipe top plate, removing any loose deposition or flakes.  Continue to re-moisten the UltraSOLV® Sponge in container of DI water as necessary
Step 6: Take dampened 360 Grit Diamond ScrubDISK® attached to ErgoSCRUB® and scrub TOK Top Plate (See Fig 2)
Scrubbing top plate
Fig 2: ErgoSCRUB® w/360 Grit Diamond ScrubDISK® scrubbing top plate
Step 7: As loose deposition begins to build up on the top plate, take UltraSOLV® Sponge and wipe the area free of deposition
Step 8: Continue to rinse out sponge in container of DI water as necessary to free UltraSOLV® Sponge of excess deposition
 
Step 9: As ScrubDISK® loads up with deposition, pull & twist ScrubDISK® across dampened UltraSOLV® Sponge to unload ScrubDISK® (See Fig 3, 4 & 5)
Loaded ScrubDISK
Pull ScrubDISK across Sponge
Unloaded ScrubDISK
Fig 3: ScrubDISK® loaded with deposition
Fig 4: Pull and Twist ScrubDISK® across UltraSOLV® Sponge
Fig 5: Unloaded ScrubDISK®
 
Step 10: As UltraSOLV® Sponge becomes loaded with deposition, rinse in container of DI water (See Fig 6 & 7)
Loaded UltraSOLV Sponge
UltraSOLV after rinse
Fig 6: Loaded-up UltraSOLV® Sponge
Fig 7: UltraSOLV® Sponge AFTER rinse
Step 11: Repeat steps 6 – 10, scrubbing the remaining areas of the top plate.  Rinse out UltraSOLV® Sponge and unload 360 Grit Diamond ScrubDISK® as necessary
 
Step 12: Moisten the HT4536D 360 Grit Diamond ScrubPAD in container of DI water and re-scrub all areas of the top plate using the same technique described above (UNLOAD ScrubPAD AS NECESSARY), concentrating on the areas of heavier deposition buildup and hard to reach areas throughout the top plate  (See Fig 8)
 
  Scrubbing top plate  
 
Fig 8: 360 Grit Diamond ScrubPAD scrubbing top plate
 
 
Step 13: Pending size of top plate, have second technician follow the same steps using a second FT901 ErgoSCRUB® with HT4536DC3 360 Grit Diamond ScrubDISK® and/or HT4536D 360 Grit Diamond ScrubPAD in order to minimize time of scrub (See Fig 9)
Two technicians working together
 
Fig 9: Two technicians scrubbing TOK Top Plate
 
Step 14: When deposition has been sufficiently removed from top plate, rinse out UltraSOLV® Sponge with fresh DI water and re-wipe the entire top plate in preparation for FINAL WIPE PROCEDURE
Step 13: When deposition has been sufficiently removed throughout entire Quantum–X™ process chamber, rinse out UltraSOLV® Sponge with fresh DI water and re-wipe the entire Quantum–X™ Process Chamber in preparation for FINAL WIPE PROCEDURE (See Fig 12 & 13)
FINAL WIPE PROCEDURE:
IMPORTANT NOTE
THE USE OF HT5790S MiraWIPES® DURING THE FINAL WIPE PORTION OF THE PROCEDURE IS A CRITICAL STEP TO EFFECTIVELY REMOVE PARTICLE DEFECTS FROM TOK TOP PLATE
 
Figure below shows how much more deposition the Foamtec International MiraWIPE® can remove from a critical surface compared to the standard fab wiper, making the MiraWIPE® FINAL WIPE PROCEDURE the most CRITICAL STEP of the PM procedure (See Fig 10a & 10b)
MiraWIPES are more effective
Fig 10a: Current fab wiper after completely wiping the top plate
Fig 10b: Particles picked up using HT5790S MiraWIPES® after completely wiping with current fab wiper
Red Arrow
Red Arrow
 
MiraWIPES® are the KEY STEP for DEFECT REDUCTION and IMPROVED TOOL RECOVERY
Step 15: Fold an HT5790S MiraWIPE® into quarters, apply IPA throughout wiper and proceed to wipe entire TOK Photo Top Plate
Step 16: Repeat as necessary with remaining MiraWIPES® to effectively wipe down TOK Photo Top Plate