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| BEFORE | AFTER | |
| Vacuum Chamber PM Technique | ||
| Varian VIISion™ 80 Source Chamber | ||
| OBJECTIVE: | ||
TO EFFECTIVELY PM THE VARIAN VIISION™ 80 SOURCE CHAMBER IN A TIMELY MANNER, WHILE HELPING TO MINIMIZE PARTICLE ISSUES, IMPROVE TOOL PERFORMANCE AND REDUCE HAZARDOUS WASTE |
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| Vacuum Chamber: | VARIAN VIISION™ 80 SOURCE CHAMBER | |
| Vacuum Chamber Process Residue: | BF3, P, SB, IN, ASH3 BEAM DEPOSITION | |
| Vacuum Chamber Components: | SOURCE CHAMBER |
| Old Procedure: | Scotch-Brite™, hydrogen peroxide (H2O2), 40 grit sand paper, wire mesh | |
| Solvent: DI water, IPA (only) | ||
| DANGER: Use of Hydrogen Peroxide (H2O2) causes a variety of Environmental, Health, and Safety concerns. Can cause prolonged pump down times and High Voltage Arcing. Breathing Apparatus and Full Acid PPE is recommended while scrubbing with H2O2. Scrubbing Phosphorus while using H2O2 increases the Risk of fires and/or the Release of Hazardous Chemical Fumes, Potentially resulting in Personal Injury and Property Damage |
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| Vacuum Chamber Products: | ||
NOTE: INITIAL CLEAN MAY REQUIRE THE USE OF ADDITIONAL PRODUCTS TO EFFECTIVELY CLEAN CHAMBER BACK TO BARE METAL RECOMMEND: PERFORM A ROUND OF 2-3 PM’S ON SAME TOOL TO ESTABLISH SUFFICIENT DATA FOR EVALUATION |
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| Varian VIISion™ 80 Source Chamber CleanPM Procedure: | ||||||
| View “How to” instructional videos on http://www.foamtecintlwcc.com/video/ | ||||||
| Step 1: | Remove all source parts from source chamber (source head, bushing, etc…). | |||||
| Step 2: | Vacuum inside of the chamber using an approved arsenic vacuum system. | |||||
| Step 3: | Wipe-down inside of the chamber using an H2O dampened UltraSOLV® HT4754 Sponge. | |||||
| Step 4: | Using a DI water dampened HT4536DC-1 ScrubDISK®, attached to the FT901 ErgoSCRUB®, scrub an 8”x8” area within the source chamber. | |||||
| Step 5: | Wipe-down the affected chamber area using the DI water dampened UltraSOLV® HT4754 sponge. | |||||
| Step 6: | Unload the ScrubDISK® of deposition by wiping the UltraSOLV® HT4754 Sponge with the ScrubDISK® in one direction (See Fig 1, 2 & 3). | |||||
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Fig 1: ScrubDISK® loaded with deposition |
Fig 2: Pull & twist ScrubDISK® across UltraSOLV® Sponge |
Fig 3: Unloaded ScrubDISK® |
| Step 7: | Unload the UltraSOLV® HT4754 Sponge by moistening with DI water and ringing out into a HazMat container (See Fig 4 & 5). | |||||
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| Fig 4: UltraSOLV® Sponge loaded with deposition | Fig 5: UltraSOLV® Sponge free of deposition after rinse in DI water | |||
| Step 8: | Repeat steps 4 – 7, using the HT4536D ScrubPAD and the HT179036D ScrubTIP® where necessary, until all deposition is removed. | ||
| FINAL WIPE PROCEDURE: | ||
IMPORTANT NOTE |
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| THE USE OF HT5790S MiraWIPES® DURING FINAL WIPE PORTION OF PROCEDURE IS A CRITICAL STEP TO EFFECTIVELY REMOVING PARTICLE DEFECTS FROM CHAMBER DOOR. | ||
| Figure below shows how much more deposition the Foamtec International MiraWIPE® can remove from a critical surface compared to the standard fab wiper, making the MiraWIPE® FINAL WIPE PROCEDURE the most CRITICAL STEP of the PM procedure. (See Fig 6a & 6b) | ||
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Fig 6a: Current fab wiper after completely wiping the chamber. |
Fig 6b: Particles picked up using HT5790S MiraWIPES® after completely wiping with current fab wiper. |
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MiraWIPES® are the KEY STEP for DEFECT REDUCTION and IMPROVED TOOL RECOVERY. |
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| Step 9: | Repeatedly wipe the inside of the source chamber using an IPA dampened HT5790S MiraWIPE®. Ensure to wipe entire chamber effectively until all areas are removed of deposition. |
| SOURCE CHAMBER – BEFORE CLEANING | |
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Fig 7, 8 & 9: Arsenic, Boron, Phosphorus, Antimony . . . |
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SOURCE CHAMBER – AFTER CLEANING
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Fig 10 & 11: PM completed using only DI water and IPA for final wipe-down.
NO H2O2 (Hydrogen Peroxide)
Fig 12: Total amount of hazardous waste generated.
Scotch-Brite™ is a trademark of 3M Corporation
