AMAT LPCVD PM
|Applied Materials Centura LPCVD Chamber Pre PM||Applied Materials Centura LPCVD Chamber Post PM|
Vacuum Chamber Cleaning Products are designed to give AMAT LPCVD XGEN Engineers the ability to improve PM protocols, and give our customers the opportunity to reduce Cost & Mean Time to Clean (MTTC) while improving tool availability.
- A chamber wet scrub clean is recommended by the OEM when within-wafer thickness non-uniformities increase and/or when within-wafer Rs non-uniformities increase, and is required a PM (Preventive Maintenance), e.g., every 10,000 wafers
- Cleaning tools specially designed for slit valves, quartz view ports, pump ports, shower heads, and O-ring Grooves.
- Final cleaning procedures to reduce recovery time and particle levels