AMAT Endura DeGas Chamber Cleaning
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Extend Mean Time Between Wet Cleans to > 5000 wafers
Reduce Cleaning and Recovery Times By 30% on Endura2 DeGas Chamber Heater
Minimize Particle Related Defects!
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AMAT Endura PVD DeGas Chamber 1st Generation Application Note |
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AMAT Endura PVD DeGas Chamber 3rd Generation Application Note |
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Vacuum Chamber Cleaning Products are designed to give Endura DeGas Chamber Engineers the ability to improve PM protocols, and give our customers the opportunity to reduce Cost & Mean Time to Clean (MTTC) while improving tool availability.
- A chamber wet scrub clean is recommended by the OEM when within-wafer thickness non-uniformities increase and/or when within-wafer Rs non-uniformities increase, and is required a PM (Preventive Maintenance), e.g., every 10,000 wafers
- Cleaning tools specially designed for slit valves, quartz view ports, pump ports, shower heads, and O-ring Grooves.
- Final cleaning procedures to reduce recovery time and particle levels
| AMAT Endura PVD DeGas Chamber 3rd Generation Application Note | AMAT Endura PVD DeGas Chamber, 1st Generation Application Note |
Supporting Data:
- AMAT DeGas Chamber Before & After Particle Data
- Product Application Chart
- AMAT PVD DeGas Heater PM Comparison
Contact Us for a faster, easier PMOther Application Notes and Training Guides