Vacuum Chamber Cleaning Abrasive ScrubPADS

Datasheet

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ScrubPADS® Quickly & Safely Remove Process Residues from Vacuum Chambers in the Semiconductor, LCD and Solar Cell Industries

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Vacuum Chamber UltraSOLV® ScrubPADS are patented scrubbing tools for use in PM procedures on process equipment in Wafer Fab, flat panel display, optical component and hard disk drive industries. The availability of various sized diamond, silicon carbide and aluminum oxide abrasives allow for safe and efficient scrubbing of the most difficult to clean process chambers. UltraSOLV® ScrubPADS, used in conjunction with UltraSOLV® Sponges, Wipers, and Swabs, reduce cleaning times, pump down times and contamination levels for critical process tools.

VACUUM CHAMBER ScrubPAD ADVANTAGES

  • Wide grit selection allows for quick removal of process-induced residue from aluminum, stainless steel, ceramic, glass, quartz and anodized vacuum chamber surfaces while minimizing tool wear.
  • The fiber-free construction of ScrubPADS greatly reduces particle levels in cleaned tools. By using washed abrasives, harmful ionic residues are minimized.
  • Unique bonding technology minimizes the release of abrasive particles leading to vacuum chamber PM procedures.
  • Enables the elimination of H2O2 from PMs, leading to greatly reduced recovery times.

Selecting ScrubPADS

Vacuum Chamber Cleaning ScrubPAD® Catalog

  • Vacuum Chamber Cleaning ScrubPADS® remove hardened process residue from Hi vacuum chambers used to process semiconductors, LCD panels, magnetic media, GMR heads, Optics, Solar Cells and MEMS Device.
  • Vacuum Chamber Cleaning ScrubPADS® are fiber-free so are an ideal replacement for Scotch-Brite™.
Part Number

Picture
(Click for dimension details)

 Description
HT4514D 140 Grit Diamond ScrubPAD Vacuum Chamber Cleaning ScrubPADS® with 140 Diamond grit abrasive particles for very heavy duty PM procedures. Ideal for cleaning very hard legacy process residue from Ion Implant, Novellus and AMAT HDP CVD and Roth and Rau SiNX CVD tools.
HT4518D 180 Grit Diamond ScrubPAD
Vacuum Chamber Cleaning ScrubPADS® with 180 Diamond grit abrasive particles for heavy duty PM procedures. Ideal for Ion Implant, Novellus and AMAT HDP CVD and Roth and Rau SiNX CVD tools.
HT4522D 220 Grit Diamond ScrubPAD Vacuum Chamber Cleaning ScrubPADS® with 220 Diamond grit abrasive particles for heavy duty PM procedures. Ideal for Ion Implant, Novellus/AMAT HDP CVD and Roth and Rau SiNX CVD tools.
HT4528D 280 Grit Diamond ScrubPAD
Vacuum Chamber Cleaning ScrubPADS® with 280 Diamond grit abrasive particles for heavy duty PM procedures. Ideal for removing medium hardness process residue from Ion Implant, Novellus and AMAT HDP CVD and Roth and Rau SiNX CVD tools.
HT4536D 360 Grit Diamond ScrubPAD
Vacuum Chamber Cleaning ScrubPADS® with 360 Diamond grit abrasive particles for medium duty PM procedures. Ideal for removing medium amounts of process residue from wafer processing tools such as LAM 9600 and 2300 Etch chambers, Hitachi Etch chambers, TEL Etch Chambers, Ion Implant, Novellus Speed and AMAT TxZ, WxZ, DxZ, SinGEN, PolyGEN, Endura and Producer CVD, PVD tools and Roth and Rau SiNX CVD tools.
HT4580D 800 Grit Diamond ScrubPAD Vacuum Chamber Cleaning ScrubPADS® with 800 Diamond grit abrasive particles for medium to light duty PM procedures. Ideal for wafer processing tools such as LAM 9600 and 2300 Etch chambers, Hitachi Etch chambers, TEL Etch Chambers, Varian Ion Implant Process Areas, Novellus Speed, AMAT TxZ, WxZ, DxZ, SinGEN, PolyGEN, Endura and Producer CVD, PVD tools and Roth and Rau SiNX CVD tools.
HT4513PD 1350 Grit Diamond ScrubPAD Vacuum Chamber Cleaning ScrubPADS® with 1350 Diamond grit abrasive particles for light duty PM procedures. Ideal for final polishing of wafer processing tools including LAM 9600 and 2300 Etch chambers; Hitachi and TEL Etch Chambers; AMAT CVD, PVD and CMP tools such as TxZ, WxZ, DxZ, SinGEN, PolyGEN, Mirra and Reflexion.
HT4520PD 2000 Grit Diamond ScrubPAD Vacuum Chamber Cleaning ScrubPADS® with 2000 Diamond grit abrasive particles for very light final polishing of sealing surfaces, ESC's and O-ring grooves in high vacuum chambers.
HT4530PD 3000 Grit Diamond ScrubPAD Vacuum Chamber Cleaning ScrubPADS® with 3000 Diamond grit abrasive particles for very light final polishing of sealing surfaces, ESC's and O-ring grooves in high vacuum chambers.
HT4540PD 4000 Grit Diamond ScrubPAD Vacuum Chamber Cleaning ScrubPADS® with 4000 Diamond grit abrasive particles for very light final polishing of sealing surfaces, ESC's and O-ring grooves in high vacuum chambers.
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