Cleaning hardened photo resist(PR) from resist coaters has always been a challenge in FPD fabs but with the advent of Gen 5, 6 and 7 substrates the problem has been amplified. Now for the first time
engineers have a viable cleaning method to remove hardened PR residue.
• Reduced Top Plate PM Times
• Eliminates Resist Peeling Defects And Expensive Outsourcing of Top Plate
• Reduced Particle Defects