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Don’t Let Buildup Become Your Downfall: Introducing the Foamtec RPS Cleaning Kit for MKS Remote Plasma Sources

by | May 17, 2024

We explored the hidden threat of particle and process residue buildup within the plasma strike channel of MKS remote plasma sources. This buildup can significantly impact tool performance, leading to:

  • Decreased cleaning efficiency
  • Non-uniform cleaning
  • Source degradation and reduced lifespan

At Foamtec, we understand the critical role MKS plasma sources play in maintaining a clean and productive semiconductor manufacturing environment. That’s why we’ve developed the innovative RPS Cleaning Kit, specifically designed to combat buildup and ensure optimal performance of your MKS remote plasma source.

Introducing the Power Couple: Long Swab and Rope Wiper


The Foamtec RPS Cleaning Kit boasts a two-pronged approach to tackle even the most stubborn residue:

  • Long Swab for Focused Cleaning: This extended-length swab boasts a specialized cleaning head that reaches deep into the vertical portion of the plasma strike channel. The image below showcases a used long swab, where process residue is clearly visible on the cleaning head, demonstrating its effectiveness in removing contaminants.
  • Rope Wiper for Comprehensive Cleaning: This unique, rope-like wiper efficiently cleans the entire length of the plasma strike channel. Its long, flexible design ensures thorough cleaning and minimizes the risk of missing any critical areas. Imagine a picture of the rope wiper here, similar to a long, white pipe cleaner. Unfortunately, including an image of a dirty rope wiper would be rather difficult as the contamination would likely be trapped within the fibers and not easily visible on the exterior.

Contact us today to learn more about our RPS Cleaning Kit:

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