Tokyo Ohka Kogyo (TOK) Resist Coater
Cleaning hardened photo resist(PR) from resist coaters has always been a challenge in FPD fabs but with the advent of Gen 5, 6 and 7 substrates the problem has been amplified. Now for the first time engineers have a viable cleaning method to remove hardened PR residue.
Advantages
Reduced Top Plate PM Times
Eliminates Resist Peeling Defects And Expensive Outsourcing of Top Plate
Reduced Particle Defects
Traditional Cleaning SOP's Leave Process Residue Causing Long Recovery Times and Create Scotch-Brite™ Related Particle Issues
Foamtec's Vacuum Chamber Cleaning Kits Eliminate Scotch-Brite™ and Return Chambers to Like New Condition
About Foamtec WCC
Foamtec's mission is to enable contamination control professionals to improve particle control in clean rooms by solving surface contamination challenges. The Wilshire Contamination Control Division of Foamtec International supplies clean room mops, foam swabs, microfiber swabs, foam wipers, microfiber wipers, UltraSOLV® ScrubPADS to address clean room cleaning and the critical cleaning of process equipment.