MiraWIPE® 256 Wipes Ultra-Critical ISO Class 1-3 Microfiber ​

Cleanroom Microfiber Wiper for ISO 1-3 cleanrooms

In the era of sub-7nm lithography, “clean” is no longer enough. Wafer fab engineers require a wiping solution that actively defends against yield-killing excursions. MiraWIPE 256 has established itself as the most widely employed cleanroom wiper for advanced nodes because it does more than wipe—it restores process chambers to baseline performance faster than any alternative.

While traditional polyester wipers often smear contamination and shed fibers, MiraWIPE 256 utilizes a specialized microfiber matrix designed to dislodge and entrap sub-micron particulates. This architectural advantage is why MiraWIPE is production-proven to secure first-pass qualification rates above 90% in the world’s most advanced fabs.

Critical surfaces demand critical care. Transitioning to MiraWIPE 256 fab-wide offers the total elimination of fiber scratch defects, protecting invaluable assets like electrostatic chucks and wafer handling end-effectors from abrasion. Don’t risk your yield on “good enough.” Choose the wiper that reveals—and removes—the contamination others leave behind.

The MiraWIPE 256 is laundered and packed in to ensure compatibility with ISO Class 1 cleanrooms. MiraWIPE is lot tested and certified by LPC, Helmke drum, and optical test methods to ensure control of submicron to 500-micron particles. All wipers are double-bagged to aid cleanroom entry protocols.