MiraSAT™ 100% UPW Wipes/ The VOC Free Cleanroom Wiper

MiraSAT™ Enables High Precision Preventive Maintenance

Combined with the UltraSOLV® ScrubPAD and Sponge, MiraSAT’s capabilities to dislodge, entrap and remove stubbornly adhered contamination reduces wiper usage, hazardous waste and equipment recovery time. MiraSAT's cleaning efficiency saves valuable equipment technician time.

• For use in ISO Class 3 and higher cleanrooms.
• Cleaning of hi-vac process chambers and robotics in flat panel display and wafer fabs.
• Cleaning VOC sensitive process equipment in lithography, CVD and metrology modules.
• Cleaning baked-on resist and developer from lithography tracks.
• Final wipedown of sensitive components such as EFEM’s, electrostatic chucks, VAT valves and gas dispersion plates.
• Equipment PM’s and wet cleans where the elimination of VOC’s and flammable solvents are required.
• Ideal for cleaning wafer handling systems to eliminate linear scratch defect events.

• Protects VOC sensitive fab modules such as lithography, metrology and CVD from solvent fumes.
• Industry leading abrasion resistant fabric reduces risks of fiber and particle excursions associated with fab wipers.
• Woven microfiber fabric enables improved contamination pickup leading to faster PM’s and improved equipment uptime.
• Even, consistent, drip-free wetting of surfaces enables excellent first pass cleaning and minimizes corrosion damage to metal etch chambers.
• Foamtec’s state of the art processing facilities produces a wiper optimized for use in the most advanced wafer fabs.
• Greatly reduces corrosion damage to metal etch chambers by minimizing dripping of corrosive liquid into recessed areas and pump ports.

Environmental Constraints for the Semiconductor Industry are only Increasing

Implementing MiraSAT™ helps wafer fabs to remain within their air permit limits while making a step change improvement in environmental compliance and cost avoidance.

• Reduce flammable chemical storage, solvent squirt bottles, and eliminate the fire risk during cleanroom wipe downs.
• Eliminate fugitive VOC emissions and air permit implications associated with solvent wiping.
• Eliminate personnel exposure to isopropyl alcohol during cleanroom wipe downs.