Utilizing Foamtec ScrubPADS and Advanced Microfiber Cleanroom Wipers to Improve Safety and Cleanliness on Ion Implant Wet Cleans
by Foamtec | Jun 20, 2023 | foreign particle contamination, particle control
Ion implanters are vital tools in the semiconductor manufacturing industry, and regular cleaning is essential to maintain their performance. However, wet cleaning with hydrogen peroxide (H2O2) and *Scotch-Brite™ can pose significant fire and health hazards when used...Redefining PM Procedures for Electrostatic Chucks to Improve Post PM Particle Performance and Increase Service Life
by Foamtec | Mar 22, 2023 | cleanroom cleaning, cleanroom wipes, foreign particle contamination, particle control
In wafer fabs, cleaning electrostatic chucks (ESCs) and wafer pedestals is crucial in vacuum chamber PMs. The ESCs are susceptible to scratch damage, so traditional cleaning tools like *Scotch-Brite™ are not recommended. Instead, customers have adopted ceramic blades...
How to Improve Vacuum Chamber PM’s in Semiconductor Fabs
by Foamtec | Feb 27, 2023 | cleanroom cleaning, foreign particle contamination, particle control, Semiconductor
Semiconductor fabs are among the most demanding industrial environments, where particle control and productivity are critical factors in achieving the highest quality products. Any contamination, whether it be from particles or byproducts, can result in defects, yield...