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How to Select the Proper Cleanroom Wiper for Photolithography Track Wet Cleans

by Foamtec | Jan 30, 2023 | cleanroom cleaning, cleanroom wipes, foreign particle contamination, particle control

In photolithography modules, keeping TEL tracks clean is critical in preventing contamination in the ASML DUV TWINSCAN scanner. Contamination in the scanner can lead to two main scenarios: low vacuum in the P-chuck and TSU and wafer table flatness issues on the wafer...

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How to Select the Proper Cleanroom Wiper for Photolithography Track Wet Cleans

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